COMAR | Materials from KRISS

Reference Materials from: KRISS

must be: produced under an ISO 17034 accreditation produced by an NMI / DI one, or both options | certified RM

	Producer	RM Code	Name	Item	Updated
1	KRISS	KRISS 103-04-033	Hf0.6Si0.4O2 thin film CRM (1.4 nm)	solid	22-06-2022
	Properties: Thickness of Hf0.6Si0.4O2 layer <1.39 nm			Remarks: This CRM is indended for use as a calibration standard for the thickness measurement of Hf0.6Si0.4O2 films by using spectroscopic ellipsometry (SE), transmission electron microscopy (TEM), X-ray reflectometry (XRR), X-ray photoelectron spectroscopy (XPS) and so on. Intended Use: This CRM is indended for use as a calibration standard for the thickness measurement of Hf0.6Si0.4O2 films by using spectroscopic ellipsometry (SE), transmission electron microscopy (TEM), X-ray reflectometry (XRR), X-ray photoelectron spectroscopy (XPS) and so on. CRM Certificate: 103-04-033.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, Division of Technology Services (Korea (South))
	Public link to this factsheet: www.comar.bam.de/rm/476455