Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-522.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-532.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 200 nm, Diameter of wafer : 100 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-506.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 200 nm, Diameter of wafer : 150 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-516.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-526.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-536.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 40 nm, Diameter of wafer : 100 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-503.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 40 nm, Diameter of wafer : 150 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-513.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-523.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-533.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)