COMAR | Materials

Reference Materials

must be: produced under an ISO 17034 accreditation produced by an NMI / DI one, or both options | certified RM

Reference Materials

	Producer	RM Code	Name	Item	Updated
1	KRISS	KRISS 207-03-521	(10 nm thick., 200 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 11.34 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-521.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494476
2	KRISS	KRISS 207-03-531	(10 nm thick., 300 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 11.33 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-531.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494482
3	KRISS	KRISS 207-03-525	(120 nm thick., 200 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 118.18 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-525.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494480
4	KRISS	KRISS 207-03-535	(120 nm thick., 300 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 118.18 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-535.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494486
5	KRISS	KRISS 207-03-522	(20 nm thick., 200 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 20.62 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-522.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494477
6	KRISS	KRISS 207-03-532	(20 nm thick., 300 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 20.62 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-532.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494483
7	KRISS	KRISS 207-03-526	(200 nm thick., 200 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 193.51 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-526.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494481
8	KRISS	KRISS 207-03-536	(200 nm thick., 300 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 193.51 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-536.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494487
9	KRISS	KRISS 207-03-523	(40 nm thick., 200 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 39.87 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-523.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494478
10	KRISS	KRISS 207-03-533	(40 nm thick., 300 mm wafer) Certified reference material for the thickness of a thin film layer of silicon nitride grown on silicon	thin-film thickness	28-07-2023

	Properties: thickness of silicon nitride thin film layer 39.87 nm			Remarks: This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. Intended Use: This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film. CRM Certificate: 207-03-533.pdf
	Producer: (click for contact & purchase details) KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South)) This material is produced under a valid ISO 17034 accreditation \| This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)
	Public link to this factsheet: www.comar.bam.de/rm/494484