Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 10 nm, Diameter of wafer : 100 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-501.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 10 nm, Diameter of wafer : 150 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-511.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-521.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-531.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 120 nm, Diameter of wafer : 100 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-505.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 120 nm, Diameter of wafer : 150 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-515.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-525.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer.

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-535.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
- This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 20 nm, Diameter of wafer : 100 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-502.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)

Remarks:
This thickness certified reference material(CRM) of thin film layer is a thin film layer sample grown on a single crystal silicon wafer. (Nominal thickness of silicon nitride film layer: 20 nm, Diameter of wafer : 150 mm)

Intended Use:
This CRM is used to calibrate optical instruments such as ellipsometers which have a capability to measure the thickness of a film.

CRM Certificate:  207-03-512.pdf

Producer: (click for contact & purchase details)
 KRISS, Korea Research Institute of Standards and Science, , Division of Technology Services (Korea (South))

This material is produced under a valid ISO 17034 accreditation | This material is linked to statutory activities as a national metrology institute (NMI) / a designated institute (DI)